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Electrodeposition of Ge, Si and SixGe1−x from an air- and water-stable ionic liquid

Corresponding authors
Institute of Particle Technology, Chair of Interface Processes, Clausthal University of Technology, Clausthal-Zellerfeld, Germany
Phys. Chem. Chem. Phys., 2008,10, 4650-4657

DOI: 10.1039/B806996B
Received 24 Apr 2008, Accepted 30 May 2008
First published online 18 Jun 2008
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