A self-propagating system for Ge incorporation into nanostructured silica
Abstract
Technologically-relevant levels of Ge can be incorporated into cell wall
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Publication details
The article was received on 26 Mar 2008, accepted on 01 Jul 2008 and first published on 04 Aug 2008
Article type:
Communication
DOI:
10.1039/B804955F
Citation:
Chem. Commun., 2008,0, 4495-4497
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A self-propagating system for Ge incorporation into nanostructured silica
A. K. Davis and M. Hildebrand, Chem. Commun., 2008, 0, 4495DOI: 10.1039/B804955FIf you are not the author of this article and you wish to reproduce material from it in a third party non-RSC publication you must formally request permission using RightsLink. Go to our Instructions for using RightsLink page for details.
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