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Journal of Materials Chemistry was published between 1991 and 2012. From issue 1, 2013, it was replaced by three new journals: Journal of Materials Chemistry A, B and C

A low valent metalorganic precursor for the growth of tungsten nitride thin films by atomic layer deposition

Corresponding authors
Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, Finland
Department of Chemistry, Wayne State University, 5101 Cass Avenue, Detroit, USA
Department of Chemistry, University of Helsinki, P.O. Box 55, FIN-00014 University of Helsinki, Finland
IMEC, Kapeldreef 75, Belgium
Institute for Manufacturing Research, 3123 Engineering, Wayne State University, 5050 Anthony Wayne Drive, Detroit, USA
Ångström Microstructure Laboratory, Department of Engineering Sciences, Uppsala University, Sweden
J. Mater. Chem., 2007,17, 1109-1116

DOI: 10.1039/B610873C
Received 28 Jul 2006, Accepted 06 Dec 2006
First published online 02 Jan 2007
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