Jump to main content
Jump to site search

Issue 11, 2007
Previous Article Next Article

Aerosol-assisted chemical vapour deposition of WO3 thin films using polyoxometallate precursors and their gas sensing properties

Author affiliations

Abstract

Aerosol-assisted chemical vapour deposition (AACVD) of polytungstates in acetonitrile or water yielded thin films of tungsten oxide on glass. AACVD reactions of [NH4]6[W12O39] and [NH4]10H2[W2O7]6 and of [nBu4N]4[W10O32] and [nBu4N]2[W6O19] at substrate temperatures exceeding 500 °C resulted in the formation of yellow films comprised of randomly-orientated crystalline monoclinic WO3. In contrast, the films deposited from [nBu4N]3[WO4] were blue and showed preferred orientation along the <010> direction, with the direction of crystallites becoming increasingly randomised with increasing deposition temperature. Annealing these films in air for 30 minutes at 550 °C yielded yellow films in which the crystallites were randomly orientated. The WO3 films functioned as gas sensors showing a linear change in electrical resistance upon exposure to trace amounts of ethanol and nitrogen dioxide vapour in air, with responses comparable to that of screen-printed sensors and a faster speed of response. Furthermore, the CVD sensors gave a maximum response to nitrogen dioxide at a significantly lower temperature (250 °C) than the screen-printed sensor.

Graphical abstract: Aerosol-assisted chemical vapour deposition of WO3 thin films using polyoxometallate precursors and their gas sensing properties

Back to tab navigation
Please wait while Download options loads

Publication details

The article was received on 08 Dec 2006, accepted on 24 Jan 2007 and first published on 09 Feb 2007


Article type: Paper
DOI: 10.1039/B617982G
Citation: J. Mater. Chem., 2007,17, 1063-1070
  •   Request permissions

    Aerosol-assisted chemical vapour deposition of WO3 thin films using polyoxometallate precursors and their gas sensing properties

    S. Ashraf, C. S. Blackman, R. G. Palgrave and I. P. Parkin, J. Mater. Chem., 2007, 17, 1063
    DOI: 10.1039/B617982G

Search articles by author