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The effect of oxygen-containing reagents on the crystal morphology and orientation in tungsten oxide thin films deposited via atmospheric pressure chemical vapour deposition (APCVD) on glass substrates

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Christopher Ingold Laboratory, University College London, 20 Gordon Street, London, United Kingdom
E-mail: i.p.parkin@ucl.ac.uk
Faraday Discuss., 2007,136, 329-343

DOI: 10.1039/B615877C
Received 01 Nov 2006, Accepted 19 Jan 2007
First published online 11 Apr 2007
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