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The effect of oxygen-containing reagents on the crystal morphology and orientation in tungsten oxide thin films deposited via atmospheric pressure chemical vapour deposition (APCVD) on glass substrates

Corresponding authors
Christopher Ingold Laboratory, University College London, 20 Gordon Street, London, United Kingdom
Faraday Discuss., 2007,136, 329-343

DOI: 10.1039/B615877C
Received 01 Nov 2006, Accepted 19 Jan 2007
First published online 11 Apr 2007
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