Issue 39, 2007
From the journal:

Chemical Communications

Inorganic polymer photoresist for direct ceramic patterning by photolithography†

Tuan Anh Pham,a   Pilnam Kim,b   Moonkyoo Kwak,b   Kahp Y. Suhb  and  Dong-Pyo Kim*a  

* Corresponding authors

a Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea
E-mail: dpkim@cnu.ac.kr
Fax: 82 42 823 6665
Tel: 82 42 821 6695

b School of Mechanical and Aerospace Engineering and Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Korea

Abstract

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 °C.

Graphical abstract: Inorganic polymer photoresist for direct ceramic patterning by photolithography

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Article information

DOI
https://doi.org/10.1039/B708480C
Article type
Communication
Submitted
05 Jun 2007
Accepted
13 Aug 2007
First published
30 Aug 2007

Chem. Commun., 2007, 4021-4023

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Inorganic polymer photoresist for direct ceramic patterning by photolithography

T. A. Pham, P. Kim, M. Kwak, K. Y. Suh and D. Kim, Chem. Commun., 2007, 4021 DOI: 10.1039/B708480C

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