Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance upgrade on Thursday 4th of May 2017 from 8.00am to 9.00am (BST).

During this time our websites will be offline temporarily. If you have any questions please use the feedback button on this page. We apologise for any inconvenience this might cause and thank you for your patience.


Issue 39, 2007
Previous Article Next Article

Inorganic polymer photoresist for direct ceramic patterning by photolithography

Author affiliations

Abstract

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 °C.

Graphical abstract: Inorganic polymer photoresist for direct ceramic patterning by photolithography

Back to tab navigation
Please wait while Download options loads

Supplementary files

Publication details

The article was received on 05 Jun 2007, accepted on 13 Aug 2007 and first published on 30 Aug 2007


Article type: Communication
DOI: 10.1039/B708480C
Citation: Chem. Commun., 2007, 4021-4023
  •   Request permissions

    Inorganic polymer photoresist for direct ceramic patterning by photolithography

    T. A. Pham, P. Kim, M. Kwak, K. Y. Suh and D. Kim, Chem. Commun., 2007, 4021
    DOI: 10.1039/B708480C

Search articles by author