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Inorganic polymer photoresist for direct ceramic patterning by photolithography

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Corresponding authors
a
Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea
E-mail: dpkim@cnu.ac.kr
Fax: 82 42 823 6665
Tel: 82 42 821 6695
b
School of Mechanical and Aerospace Engineering and Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Korea
Chem. Commun., 2007, 4021-4023

DOI: 10.1039/B708480C
Received 05 Jun 2007, Accepted 13 Aug 2007
First published online 30 Aug 2007
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