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Issue 39, 2007
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Inorganic polymer photoresist for direct ceramic patterning by photolithography

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Abstract

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 °C.

Graphical abstract: Inorganic polymer photoresist for direct ceramic patterning by photolithography

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Publication details

The article was received on 05 Jun 2007, accepted on 13 Aug 2007 and first published on 30 Aug 2007


Article type: Communication
DOI: 10.1039/B708480C
Citation: Chem. Commun., 2007,0, 4021-4023
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    Inorganic polymer photoresist for direct ceramic patterning by photolithography

    T. A. Pham, P. Kim, M. Kwak, K. Y. Suh and D. Kim, Chem. Commun., 2007, 0, 4021
    DOI: 10.1039/B708480C

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