Jump to main content
Jump to site search

Chemical Communications

Urgent high quality communications from across the chemical sciences.


Inorganic polymer photoresist for direct ceramic patterning by photolithography

Corresponding authors
Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea
E-mail: dpkim@cnu.ac.kr
Fax: 82 42 823 6665
Tel: 82 42 821 6695
School of Mechanical and Aerospace Engineering and Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Korea
Chem. Commun., 2007, 4021-4023

DOI: 10.1039/B708480C
Received 05 Jun 2007, Accepted 13 Aug 2007
First published online 30 Aug 2007
Please wait while Download options loads