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Issue 5, 2006
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Mixed amide–malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

A. Milanov,a  R. Bhakta,a  R. Thomas,b  P. Ehrhart,b  M. Winter,a  R. Waserb  and  A. Devi*a 
Author affiliations

* Corresponding authors

a Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, Bochum, Germany
E-mail: anjana.devi@rub.de

b IFF-Institut für Festkörperforschung and CNI-Center for Nanoelectronic Systems for Information Technology, Forschungszentrum Jülich, Jülich, Germany

Abstract

The concept of introducing malonates as chelating ligands in combination with metal amides has yielded a new class of compounds which enable growth of HfO2 thin films at low deposition temperatures by liquid injection metalorganic chemical vapour deposition.

Graphical abstract: Mixed amide–malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

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Publication details

The article was received on 06 Jul 2005, accepted on 02 Dec 2005 and first published on 15 Dec 2005


Article type: Communication
DOI: 10.1039/B509380E
Citation: J. Mater. Chem., 2006,16, 437-440
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    Mixed amide–malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

    A. Milanov, R. Bhakta, R. Thomas, P. Ehrhart, M. Winter, R. Waser and A. Devi, J. Mater. Chem., 2006, 16, 437
    DOI: 10.1039/B509380E

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