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Issue 2, 2006
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Characterisation of a pulsed rf-glow discharge in view of its use in OES

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Abstract

Pulsed radiofrequency glow discharges are studied in view of their possible advantages for optical emission spectroscopy (GD-OES). The excitation characteristics of a pulsed radiofrequency Grimm-type glow discharge are studied. The effects of a pulsed power supply on the sputtering are investigated and the effect on the emission yield for resonant and non-resonant emission lines is described. The enhancement of the emission yield through rf-power pulsing in the 10 μs range is attributed to a temporal reduction of the self-absorption. The possibility of analysing heat-sensitive non-conductive materials and layers through pulsed rf-GDOES is demonstrated. The work opens several subjects and questions for further research on understanding the plasma processes linked to analytical rf-GD-OES.

Graphical abstract: Characterisation of a pulsed rf-glow discharge in view of its use in OES

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Publication details

The article was received on 19 Sep 2005, accepted on 25 Nov 2005 and first published on 19 Dec 2005


Article type: Paper
DOI: 10.1039/B513279G
Citation: J. Anal. At. Spectrom., 2006,21, 112-125
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    Characterisation of a pulsed rf-glow discharge in view of its use in OES

    Th. Nelis, M. Aeberhard, M. Hohl, L. Rohr and J. Michler, J. Anal. At. Spectrom., 2006, 21, 112
    DOI: 10.1039/B513279G

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