Issue 11, 2006

Scanning near-field photolithography—surface photochemistry with nanoscale spatial resolution

Abstract

This tutorial review describes recent advances that have challenged the traditional view that the Rayleigh limit, of approximately λ/2, represents the ultimate resolution accessible using optical methods. Near-field optical methods offer a powerful capability for optical measurement and manipulation of materials. Using a scanning near-field optical microscope coupled to a UV laser it is possible to create photopatterned molecular structures with dimensions nearly 15 times smaller than the Rayleigh limit. Near-field methods offer the possibility for selective initiation of surface chemical transformations with exquisite spatial resolution, bringing the prospect of unifying top-down and bottom-up nanofabrication into view.

Graphical abstract: Scanning near-field photolithography—surface photochemistry with nanoscale spatial resolution

Article information

Article type
Tutorial Review
Submitted
04 Jul 2006
First published
11 Sep 2006

Chem. Soc. Rev., 2006,35, 1150-1161

Scanning near-field photolithography—surface photochemistry with nanoscale spatial resolution

G. J. Leggett, Chem. Soc. Rev., 2006, 35, 1150 DOI: 10.1039/B606706A

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