Jump to main content
Jump to site search

Issue 11, 2006
Previous Article Next Article

Scanning near-field photolithography—surface photochemistry with nanoscale spatial resolution

Author affiliations

Abstract

This tutorial review describes recent advances that have challenged the traditional view that the Rayleigh limit, of approximately λ/2, represents the ultimate resolution accessible using optical methods. Near-field optical methods offer a powerful capability for optical measurement and manipulation of materials. Using a scanning near-field optical microscope coupled to a UV laser it is possible to create photopatterned molecular structures with dimensions nearly 15 times smaller than the Rayleigh limit. Near-field methods offer the possibility for selective initiation of surface chemical transformations with exquisite spatial resolution, bringing the prospect of unifying top-down and bottom-up nanofabrication into view.

Graphical abstract: Scanning near-field photolithography—surface photochemistry with nanoscale spatial resolution

Back to tab navigation

Publication details

The article was received on 04 Jul 2006 and first published on 11 Sep 2006


Article type: Tutorial Review
DOI: 10.1039/B606706A
Citation: Chem. Soc. Rev., 2006,35, 1150-1161
  •   Request permissions

    Scanning near-field photolithography—surface photochemistry with nanoscale spatial resolution

    G. J. Leggett, Chem. Soc. Rev., 2006, 35, 1150
    DOI: 10.1039/B606706A

Search articles by author

Spotlight

Advertisements