Issue 14, 2006

Evolution of nickel speciation during preparation of Ni–SiO2catalysts: effect of the number of chelating ligands in [Ni(en)x(H2O)6−2x]2+ precursor complexes

Abstract

The evolution of nickel speciation during the successive preparation steps of Ni–SiO2 catalysts is studied by UV-Vis-NIR, FT-IR, DTG, TPR and TEM. The study focuses on the effect of the number of chelating ligands in the precursor complexes [Ni(en)x(H2O)(6−2x)]2+ (en = ethylenediamine, x = 1, 2, 3) on the adsorption on silica, and on nickel speciation after thermal treatment. When the en:Ni ratio in solution increases from 1 to 3, the most abundant complex is [Ni(en)(H2O)4]2+ (64% of all Ni complexes), [Ni(en)2(H2O)2]2+ (81%) and [Ni(en)3]2+ (61%), respectively. Equilibrium adsorption of [Ni(en)x(H2O)(6−2x)]2+ on SiO2 results in the selective grafting of [Ni(en)(H2O)4]2+ and [Ni(en)2(H2O)2]2+, through the substitution of two labile H2O ligands by two surface SiO groups. The surface [Ni(en)(H2O)2(SiO)2] complex formed by the grafting of [Ni(en)(H2O)4]2+ onto silica tends to transform into NiO and nickel phyllosilicate after calcination, which consequently leads to large and heterogeneously distributed metallic Ni particles upon reduction. In contrast, [Ni(en)2(SiO)2], resulting from the grafting of [Ni(en)2(H2O)2]2+ onto silica, no longer has aqua ligands able to react with other nickel complexes or silicium-containing species. Calcination transforms these complexes into isolated Ni2+ ions, which are reduced into small metallic Ni particles with a more homogeneous size distribution, even at higher Ni loading.

Graphical abstract: Evolution of nickel speciation during preparation of Ni–SiO2 catalysts: effect of the number of chelating ligands in [Ni(en)x(H2O)6−2x]2+ precursor complexes

Article information

Article type
Paper
Submitted
20 Sep 2005
Accepted
08 Feb 2006
First published
28 Feb 2006

Phys. Chem. Chem. Phys., 2006,8, 1731-1738

Evolution of nickel speciation during preparation of Ni–SiO2 catalysts: effect of the number of chelating ligands in [Ni(en)x(H2O)6−2x]2+ precursor complexes

K. Sun, E. Marceau and M. Che, Phys. Chem. Chem. Phys., 2006, 8, 1731 DOI: 10.1039/B513319J

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