Jump to main content
Jump to site search

Issue 6, 2006
Previous Article Next Article

The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

Author affiliations

Abstract

Phosphorus containing and octyl-terminated silicon nanoparticles (NPs) are generated by a solution reduction route under room temperature conditions for the first time and characterized by TEM, HRTEM, EDX, 1H/13C/31P NMR, EPR, and PL spectroscopy, then annealed to form a thin film with phosphorus doping confirmed by microprobe elemental analyses.

Graphical abstract: The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

Back to tab navigation

Supplementary files

Publication details

The article was received on 21 Sep 2005, accepted on 13 Dec 2005 and first published on 13 Jan 2006


Article type: Communication
DOI: 10.1039/B513330K
Citation: Chem. Commun., 2006,0, 658-660
  •   Request permissions

    The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

    R. K. Baldwin, J. Zou, K. A. Pettigrew, G. J. Yeagle, R. D. Britt and S. M. Kauzlarich, Chem. Commun., 2006, 0, 658
    DOI: 10.1039/B513330K

Search articles by author

Spotlight

Advertisements