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Issue 5, 2005
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Technologies for nanofluidic systems: top-down vs. bottom-up—a review

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Abstract

This paper gives an overview of the most commonly used techniques for nanostructuring and nanochannel fabrication employed in nanofluidics. They are divided into two large categories: top-down and bottom-up methods. Top-down methods are based on patterning on large scale while reducing the lateral dimensions to the nanoscale. Bottom-up methods arrange atoms and molecules in nanostructures. Here, we review the advantages and disadvantages of those methods and give some future perspectives. It is concluded that technology in the region of 1–10 nm is lacking and potentially can be covered by using the pulsed-laser deposition method as a controlled way for thin film deposition (thickness of a few nanometers) and further structuring by the top-down method.

Graphical abstract: Technologies for nanofluidic systems: top-down vs. bottom-up—a review

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Publication details

The article was received on 05 Nov 2004, accepted on 01 Mar 2005 and first published on 22 Mar 2005


Article type: Tutorial Review
DOI: 10.1039/B416951D
Citation: Lab Chip, 2005,5, 492-500
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    Technologies for nanofluidic systems: top-down vs. bottom-up—a review

    D. Mijatovic, J. C. T. Eijkel and A. van den Berg, Lab Chip, 2005, 5, 492
    DOI: 10.1039/B416951D

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