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Issue 4, 2004
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Ionic surface masking for low background in single- and double-stranded DNA-templated silver and copper nanorods

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Abstract

A straightforward procedure is presented for the fabrication of single-stranded DNA-templated silver nanorods and double-stranded DNA-templated copper nanorods with a low background of nonspecific metallic deposition. Alkali metal cations with high affinity for SiO2 are used to passivate the silicon surface, creating a physical and an electrostatic barrier against nonspecific silver or copper cation adsorption and subsequent metal deposition. For silver nanorods synthesized from single-stranded DNA, this ionic masking strategy leads to a 51% reduction in the number of nonspecifically deposited nanoparticles and an even greater decrease in their dimensions. For DNA-templated copper nanorods this surface blocking approach decreases the number of nonspecifically deposited nanoparticles by 74%. The demonstration of the use of single-stranded DNA as a template for nanorod fabrication is an important step toward the creation of nanoscale circuits by combining DNA metallization with direct surface hybridization of oligonucleotide-coupled, electronically active nanostructures at predetermined positions on single-stranded DNA.

Graphical abstract: Ionic surface masking for low background in single- and double-stranded DNA-templated silver and copper nanorods

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Publication details

The article was received on 18 Sep 2003, accepted on 08 Oct 2003 and first published on 07 Nov 2003


Article type: Paper
DOI: 10.1039/B311427A
Citation: J. Mater. Chem., 2004,14, 611-616
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    Ionic surface masking for low background in single- and double-stranded DNA-templated silver and copper nanorods

    H. A. Becerril, R. M. Stoltenberg, C. F. Monson and A. T. Woolley, J. Mater. Chem., 2004, 14, 611
    DOI: 10.1039/B311427A

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