Issue 10, 2004
From the journal:

Journal of Analytical Atomic Spectrometry

Relative calibration mode for compositional depth profiling in GD-OES

Thomas Nelis,*ab   Max Aeberhard,a   Richard Payling,ac   Johann Michlera  and  Patrick Chapond  

* Corresponding authors

a Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
E-mail: thonelis@aol.com.

b Atout & Progrès, 10 rue de la paix, F-75002 Paris, France

c Department of Physics, University of Newcastle, NSW 2308, Australia

d Jobin-Yvon Emission, 16-18 rue du Canal, F-91165 Longjumeau, France

Abstract

A calibration procedure for content depth profile analysis by glow discharge optical emission spectroscopy is presented. This new method is based on the well established relative or internal standard method. The method allows reduction of the number of CRM with known sputtering rates to a strict minimum, while still using a large number of CRMs for establishing the analytical curves. The new calibration method allows the uncertainty in the calculation of the chemical composition to be separated from the uncertainties of sputtering rate measurements. The application of this new calibration procedure is applied to industrial samples and further possible improvements are discussed.

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Article information

DOI
https://doi.org/10.1039/B406187J
Article type
Paper
Submitted
26 Apr 2004
Accepted
16 Jun 2004
First published
03 Sep 2004

J. Anal. At. Spectrom., 2004,19, 1354-1360

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Relative calibration mode for compositional depth profiling in GD-OES

T. Nelis, M. Aeberhard, R. Payling, J. Michler and P. Chapon, J. Anal. At. Spectrom., 2004, 19, 1354 DOI: 10.1039/B406187J

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