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Issue 1, 2004
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Pulsed laser ablation and deposition of thin films

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Abstract

Pulsed laser ablation is a simple, but versatile, experimental method that finds use as a means of patterning a very diverse range of materials, and in wide areas of thin film deposition and multi-layer research. Superficially, at least, the technique is conceptually simple also, but this apparent simplicity hides a wealth of fascinating, and still incompletely understood, chemical physics. This overview traces our current physico-chemical understanding of the evolution of material from target ablation through to the deposited film, addressing the initial laser–target interactions by which solid material enters the gas phase, the processing and propagation of material in the plume of ejected material, and the eventual accommodation of gas phase species onto the substrate that is to be coated. It is intended that this Review be of interest both to materials scientists interested in thin film growth, and to chemical physicists whose primary interest is with more fundamental aspects of the processes of pulsed laser ablation and deposition.

Graphical abstract: Pulsed laser ablation and deposition of thin films

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Publication details

The article was received on 13 May 2003 and first published on 06 Aug 2003


Article type: Tutorial Review
DOI: 10.1039/B207644F
Citation: Chem. Soc. Rev., 2004,33, 23-31
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    Pulsed laser ablation and deposition of thin films

    M. N. R. Ashfold, F. Claeyssens, G. M. Fuge and S. J. Henley, Chem. Soc. Rev., 2004, 33, 23
    DOI: 10.1039/B207644F

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