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Issue 14, 2004
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Mononuclear precursor for MOCVD of HfO2 thin films

Arne Baunemann,a  Reji Thomas,b  Ralf Becker,a  Manuela Winter,a  Roland A. Fischer,a  Peter Ehrhart,b  Rainer Waserb  and  Anjana Devi*a 
Author affiliations

* Corresponding authors

a Inorganic Materials Chemistry Group, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, Universitätsstr. 150, D-44780 Bochum, Germany
E-mail: anjana.devi@ruhr-uni-bochum.de
Fax: +49 234 3224174
Tel: +49 234 3224150

b Institut für Festkörperforschung/EKM, Forschungszentrum Jülich gmbH, D-52425 Jülich, Germany

Abstract

We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(OiPr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.

Graphical abstract: Mononuclear precursor for MOCVD of HfO2 thin films

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Publication details

The article was received on 06 Apr 2004, accepted on 18 May 2004 and first published on 17 Jun 2004


Article type: Communication
DOI: 10.1039/B405015K
Citation: Chem. Commun., 2004,0, 1610-1611
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    Mononuclear precursor for MOCVD of HfO2 thin films

    A. Baunemann, R. Thomas, R. Becker, M. Winter, R. A. Fischer, P. Ehrhart, R. Waser and A. Devi, Chem. Commun., 2004, 0, 1610
    DOI: 10.1039/B405015K

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