Electrochemical lithography: fabrication of nanoscale Si tips by porous anodization of Al/Si wafer

L. Pu; Y. Shi; J. M. Zhu; X. M. Bao; R. Zhang; Y. D. Zheng

doi:10.1039/B315810A

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Chemical Communications

Issue 8, 2004

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Electrochemical lithography: fabrication of nanoscale Si tips by porous anodization of Al/Si wafer

L. Pu , Y. Shi , J. M. Zhu , X. M. Bao , R. Zhang and Y. D. Zheng

Chem. Commun., 2004, 942-943

DOI: 10.1039/B315810A
Received 11 Dec 2003, Accepted 26 Feb 2004
First published on the web 18 Mar 2004

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Abstract
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Porous anodization of Al/Si wafer in sulfuric acid results in the formation of Si nanotips on the surface of Si substrate with ultrahigh packing density.

Supplementary Info

Cartoon of tip formation and discussion on the sample anodising under 40 V dc.
DOC (212K)

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L. Pu
Y. Shi
J. M. Zhu
X. M. Bao
R. Zhang
Y. D. Zheng

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Chemical Communications

Electrochemical lithography: fabrication of nanoscale Si tips by porous anodization of Al/Si wafer

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