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Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo-Jun Zhang,*a   Takashi Tanii,b   Takashi Funatsuac and   Iwao Ohdomariabd  
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a
Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Japan
E-mail: zhang@kaw.comm.waseda.ac.jp;
Fax: +81-3-5286-9076 ;
Tel: +81-3-5286-9067
b
Department of Electronical Engineering and Bioscience, School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Japan
c
Department of Physics, School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Japan
d
Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, 2-8-26 Nishi-waseda, Shinjuku-ku, Japan
Chem. Commun., 2004, 786-787

DOI: 10.1039/B315278B
Received 25 Nov 2003, Accepted 16 Feb 2004
First published online 05 Mar 2004
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