Issue 7, 2004
From the journal:

Chemical Communications

Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo-Jun Zhang,*a   Takashi Tanii,b   Takashi Funatsuac  and  Iwao Ohdomariabd  

* Corresponding authors

a Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Tokyo 162-0041, Japan
E-mail: zhang@kaw.comm.waseda.ac.jp
Fax: +81-3-5286-9076
Tel: +81-3-5286-9067

b Department of Electronical Engineering and Bioscience, School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

c Department of Physics, School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

d Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, 2-8-26 Nishi-waseda, Shinjuku-ku, Tokyo 169-0051, Japan

Abstract

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

Graphical abstract: Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

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Article information

DOI
https://doi.org/10.1039/B315278B
Article type
Communication
Submitted
25 Nov 2003
Accepted
16 Feb 2004
First published
05 Mar 2004

Chem. Commun., 2004, 786-787

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Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

G. Zhang, T. Tanii, T. Funatsu and I. Ohdomari, Chem. Commun., 2004, 786 DOI: 10.1039/B315278B

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