Jump to main content
Jump to site search

Issue 7, 2004
Previous Article Next Article

Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Author affiliations

Abstract

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

Graphical abstract: Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Back to tab navigation

Publication details

The article was received on 25 Nov 2003, accepted on 16 Feb 2004 and first published on 05 Mar 2004


Article type: Communication
DOI: 10.1039/B315278B
Citation: Chem. Commun., 2004, 786-787
  •   Request permissions

    Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

    G. Zhang, T. Tanii, T. Funatsu and I. Ohdomari, Chem. Commun., 2004, 786
    DOI: 10.1039/B315278B

Search articles by author

Spotlight

Advertisements