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Issue 8, 2003
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Chemical vapour deposition of group Vb metal phosphide thin films

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Abstract

The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 or VOCl3 with cyclohexylphosphine at substrate temperatures of 600 °C deposits thin films of amorphous vanadium phosphide. The films are black–gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500–600 °C deposits films of crystalline β-MP and at 400 °C–450 °C amorphous films of stoichiometry MP are formed. The MP films are metallic, conductive, adherent and chemically resistant.

Graphical abstract: Chemical vapour deposition of group Vb metal phosphide thin films

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Publication details

The article was received on 11 Apr 2003, accepted on 23 May 2003 and first published on 06 Jun 2003


Article type: Paper
DOI: 10.1039/B304084B
Citation: J. Mater. Chem., 2003,13, 1930-1935
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    Chemical vapour deposition of group Vb metal phosphide thin films

    C. S. Blackman, C. J. Carmalt, S. A. O'Neill, I. P. Parkin, K. C. Molloy and L. Apostolico, J. Mater. Chem., 2003, 13, 1930
    DOI: 10.1039/B304084B

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