Issue 8, 2003
From the journal:

Journal of Materials Chemistry

Chemical vapour deposition of group Vb metal phosphide thin films

C. S. Blackman,a   C. J. Carmalt,a   S. A. O'Neill,a   I. P. Parkin,*a   K. C. Molloyb  and  L. Apostolicob  

* Corresponding authors

a Department of Chemistry, University College London, 20 Gordon Street, London, WC1H 0AJ, England
E-mail: i.p.parkin@ucl.ac.uk
Tel: +44(0)2076794669

b Department of Chemistry, University of Bath, Claverton Down, Bath, BA2 4JH, England
E-mail: k.c.molloy@bath.ac.uk

Abstract

The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 or VOCl3 with cyclohexylphosphine at substrate temperatures of 600 °C deposits thin films of amorphous vanadium phosphide. The films are black–gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500–600 °C deposits films of crystalline β-MP and at 400 °C–450 °C amorphous films of stoichiometry MP are formed. The MP films are metallic, conductive, adherent and chemically resistant.

Graphical abstract: Chemical vapour deposition of group Vb metal phosphide thin films

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Article information

DOI
https://doi.org/10.1039/B304084B
Article type
Paper
Submitted
11 Apr 2003
Accepted
23 May 2003
First published
06 Jun 2003

J. Mater. Chem., 2003,13, 1930-1935

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Chemical vapour deposition of group Vb metal phosphide thin films

C. S. Blackman, C. J. Carmalt, S. A. O'Neill, I. P. Parkin, K. C. Molloy and L. Apostolico, J. Mater. Chem., 2003, 13, 1930 DOI: 10.1039/B304084B

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