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Issue 1, 2003
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Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

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Abstract

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, iPrOH or H2O) at 500–650 °C. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 µm min−1 at 500 °C. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Å. Optically, the films show minimal reflectivity from 300–1600 nm and 50–80% total transmission from 300–800 nm. Contact angles are in the range 20–40° for as-prepared films and 1–10° after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.

Graphical abstract: Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

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Publication details

The article was received on 24 Jun 2002, accepted on 03 Oct 2002 and first published on 06 Nov 2002


Article type: Paper
DOI: 10.1039/B206080A
Citation: J. Mater. Chem., 2003,13, 56-60
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    Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

    S. A. O'Neill, I. P. Parkin, R. J. H. Clark, A. Mills and N. Elliott, J. Mater. Chem., 2003, 13, 56
    DOI: 10.1039/B206080A

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