Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

Abstract

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl₄ and a co-oxygen source (MeOH, EtOH, ⁱPrOH or H₂O) at 500–650 °C. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 µm min⁻¹ at 500 °C. All films are crystalline and single phase with XRD showing the anatase TiO₂ diffraction pattern; a = 3.78(1), c = 9.51(1) Å. Optically, the films show minimal reflectivity from 300–1600 nm and 50–80% total transmission from 300–800 nm. Contact angles are in the range 20–40° for as-prepared films and 1–10° after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.