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Paper

Reactions of SiCl2 with N2O, NO and O2

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a
School of Chemistry, University of Reading, Whiteknights, Reading, UK
b
Department of Chemistry, University of Southampton, Highfield, Southampton, UK
c
Dow Corning Corporation, Mail Stop 128, 2200 W.Saltzburg Rd, 48686-0994, Midland, MI, USA
d
Instituto de Quimica-Fisica ‘Rocasolano’, C.S.I.C., C/Serrano 119, Madrid, Spain
Phys. Chem. Chem. Phys., 2003,5, 5371-5377

DOI: 10.1039/B309871K
Received 15 Aug 2003, Accepted 28 Oct 2003
First published online 18 Nov 2003
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