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Issue 10, 2002
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Intelligent window coatings: atmospheric pressure chemical vapour deposition of vanadium oxides

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Abstract

Thin films of the vanadium oxides, V2O5, VO2, VOx (x = 2.00–2.50) and V6O13 were prepared on glass substrates by atmospheric pressure chemical vapour deposition (APCVD) of vanadium tetrachloride and water at 400–550 °C. The specific phase deposited was found to be dependent on the substrate temperature and the reagent concentrations. The films were characterised by Raman microscopy, X-ray diffraction (XRD), Rutherford backscattering (RBS), scanning electron microscopy (SEM), energy dispersive analysis by X-rays (EDX), reflectance/transmittance and UV absorption spectroscopy. The VO2 films show by Raman microscopy and reflectance/transmittance spectroscopy, reversible switching behaviour at 68 °C associated with a phase change from monoclinic (MoO2 structure) to tetragonal (TiO2, rutile structure).

Graphical abstract: Intelligent window coatings: atmospheric pressure chemical vapour deposition of vanadium oxides

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Publication details

The article was received on 05 Jun 2002, accepted on 26 Jul 2002 and first published on 20 Aug 2002


Article type: Paper
DOI: 10.1039/B205427M
Citation: J. Mater. Chem., 2002,12, 2936-2939
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    Intelligent window coatings: atmospheric pressure chemical vapour deposition of vanadium oxides

    T. D. Manning, I. P. Parkin, R. J. H. Clark, D. Sheel, M. E. Pemble and D. Vernadou, J. Mater. Chem., 2002, 12, 2936
    DOI: 10.1039/B205427M

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