Journal of Analytical Atomic Spectrometry

Innovative research on the fundamental theory and application of spectrometric techniques.

Paper

Improving the detection limits for vapor phase decomposition-inductively coupled plasma mass spectrometry (VPD-ICP-MS) analysis

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Corresponding authors
a
Advanced Micro Devices Inc., 5204 East Ben White Boulevard, Mail Stop 551, Austin, USA
E-mail: evelyn.ferrero@amd.com;, dan.posey@amd.com
Fax: 512 602 9941
Tel: 512 602 3312; 512 602 4188
J. Anal. At. Spectrom., 2002,17, 1194-1201

DOI: 10.1039/B201759H
Received 18 Feb 2002, Accepted 11 Jun 2002
First published online 29 Jul 2002
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