Volume 121, 2002
From the journal:

Faraday Discussions

An FTIR study of the surface chemistry of the dynamic Si(100) surface during etching in alkaline solution

Wolfgang Haiss,a   Philipp Raisch,a   David J. Schiffrin,a   Lennart Bitscha  and  Richard J. Nichols*a  

* Corresponding authors

a University of Liverpool, Department of Chemistry, Crown Street, Liverpool, UK
E-mail: r.j.nichols@liverpool.ac.uk

Abstract

In situ FTIR spectroscopy has been used in the attenuated total reflectance (ATR) mode to investigate the surface chemistry of etching Si(100) surfaces in aqueous KOH. The effect of solution concentration and electrode potential on the Si–H vibrations has been explored and the experimental results compared with density functional theory calculations. In addition, the kinetics of surface passivation of n-Si(100) has been investigated using FTIR spectroscopy.

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Article information

DOI
https://doi.org/10.1039/B200408A
Article type
Paper
Submitted
10 Jan 2002
Accepted
24 Jan 2002
First published
06 Jun 2002

Faraday Discuss., 2002,121, 167-180

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An FTIR study of the surface chemistry of the dynamic Si(100) surface during etching in alkaline solution

W. Haiss, P. Raisch, D. J. Schiffrin, L. Bitsch and R. J. Nichols, Faraday Discuss., 2002, 121, 167 DOI: 10.1039/B200408A

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