IR laser-induced thermolysis and UV laser-induced photolysis of 1,3-diethyldisiloxane: chemical vapour deposition of nanotextured hydridoalkylsilicones

Markéta Urbanová; Zdeněk Bastl; Jan Šubrt; Josef Pola

doi:10.1039/B008437I

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Markéta Urbanová,^a Zdeněk Bastl,^b Jan Šubrt^c and Josef Pola*^a

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* Corresponding authors

^a Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, Prague, Czech Republic

^b J. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Prague, Czech Republic

^c Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, Řež near Prague, Czech Republic

Abstract

IR laser thermolysis and UV laser photolysis of gaseous 1,3-diethyldisiloxane proceed via different mechanisms: the former involves 1,1-H₂ and ethene elimination, whereas the latter is dominated by 1,1-H₂ and ethane elimination. The difference plays an important role in determining the composition of the solid nanotextured films deposited from the gas phase.

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Article information

DOI: https://doi.org/10.1039/B008437I
Article type: Paper
Submitted: 19 Oct 2000
Accepted: 02 Apr 2001
First published: 01 May 2001

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J. Mater. Chem., 2001,11, 1557-1562

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