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Issue 15, 2001
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Electrodeposition of a thin germanium film on gold from a room temperature ionic liquid

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Abstract

The electrodeposition of germanium on flame annealed Au(111) films was investigated by cyclic voltammetry (CV) and in situ scanning tunneling microscopy (STM) in the room temperature ionic liquid 1-butyl-3-methylimidazolium hexafluorophosphate containing GeI4 as germanium source. The CV shows two quasireversible redox processes at 485 ± 5 mV and − 30 ± 5 mV, one peak couple at − 430 ± 20 mV and two irreversible diffusion controlled reduction peaks at − 910 ± 10 mV and − 1510 ± 10 mV [italic v (to differentiate from Times ital nu)]s. Pt quasi reference. At potentials positive from the open circuit potential (ocp), gold oxidation starts at the steps with detectable rates up to 1 nm s−1. At − 2000 mV [italic v (to differentiate from Times ital nu)]s. Pt quasi reference, germanium overpotential deposition is observed. The surface shows a remarkable reordering: an almost disordered surface structure transforms to a layered structure on the time scale of about 1 h with an averaged terrace height of 330 ± 30 pm indicative of a (111) oriented germanium bilayer. At − 1500 mV the reoxidation starts both at the interior and at the edges of the deposited layers, leading to random wormlike nanostructures which heal on the time scale of about 2 h. The healing is a complex process comprising (electro)dissolution/electrodeposition and surface diffusion phenomena. A chemical attack of GeI4 on the deposits is clearly observed.

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Publication details

The article was received on 08 Mar 2001, accepted on 01 Jun 2001 and first published on 02 Jul 2001


Article type: Paper
DOI: 10.1039/B102232F
Citation: Phys. Chem. Chem. Phys., 2001,3, 3165-3174
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    Electrodeposition of a thin germanium film on gold from a room temperature ionic liquid

    F. Endres, Phys. Chem. Chem. Phys., 2001, 3, 3165
    DOI: 10.1039/B102232F

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