Issue 2, 1995

Photochemical formation of 9-silaanthracenes in rigid glass

Abstract

UV photolysis of 9,10-dihydro-9-silaanthracenes in 3-methylpentane glass at 77 K results in the formation of 9-silaanthracenes and diphenylmethyl-type radicals; by use of a triplet quencher, it was confirmed that these were produced via the lowest triplet state.

Article information

Article type
Paper

J. Chem. Soc., Chem. Commun., 1995, 215-216

Photochemical formation of 9-silaanthracenes in rigid glass

H. Hiratsuka, M. Tanaka, T. Okutsu, M. Oba and K. Nishiyama, J. Chem. Soc., Chem. Commun., 1995, 215 DOI: 10.1039/C39950000215

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements