SCHEDULED MAINTENANCE
Thin films of ZnO have been grown by low-pressure MOCVD using methylzinc isopropoxide, MeZn(OPri), and methylzinc tert-butoxide, MeZn(OBut), in the absence of an added oxygen source. The films were grown on to glass substrates in the temperature range 250–400 °C with growth rates of between 0.2 and 4.4 µm h–1.
J. Auld, D. J. Houlton, A. C. Jones, S. A. Rushworth, M. A. Malik, P. O'Brien and G. W. Critchlow, J. Mater. Chem., 1994, 4, 1249 DOI: 10.1039/JM9940401249
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