Estimation of the distribution of surface hydroxyl groups on silica gel, using chemical modification with trichlorosilane

Abstract

An estimate of the relative distribution of the free and bridged surface hydroxyl groups is made, using a surface modification with trichlorosilane according to the following main reaction Si—OH + HSiCl₃→Si—O—SiHCl₂+ HCl. The amount of chemisorbed chloride groups on the substrates is compared with data on the total amount of surface hydroxyl groups and with hydroxyl group information derived from infrared spectra. The interpretation of these data gives an indication of the reactivity, distribution and concentration of the different types of hydroxyl groups on the surface of silica gel.

Trichlorosilane reacts mainly with bridged hydroxyl groups on silica gel, pretreated at low temperatures and exclusively with free hydroxyls at high pretreatment temperatures.

Extrapolation of the reactivity of trichlorosilane towards the surface hydroxyl groups demonstrates that bridged hydroxyl groups are present up to pretretment temperatures of 973 K.