Jump to main content
Jump to site search

Issue 4, 1985
Previous Article Next Article

Nuclear magnetic resonance and dielectric relaxation investigations of water sorbed by Spherisorb silica

Abstract

The Spherisorb silica/sorbed water system has been investigated at coverages 0.018 ⩽Θ/gH2O g–1SiO2⩽ 0.36 using 1H n.m.r. in the temperature range 190 ⩽T/K ⩽ 300 and also at coverages 0.013 ⩽Θ/gH2O g–1SiO2⩽ 0.033 using dielectric techniques at ambient temperature. In cases where multilayer adsorption occurs there is a discontinuity in the temperature dependence of the n.m.r. linewidth accompanying a freezing phenomenon. Water molecules making up the first loosely packed adsorbed layer (complete at Θ= 0.06 gH2O g–1SiO2) remain mobile at low temperatures at all coverages. Dielectric measurements reveal another discontinuity at a coverage of ca. 0.023 gH2O g–1SiO2. Below that coverage the strength of binding of sorbed water increases with decreasing coverage, while at higher coverages additional water leads to a marked increase in the mobility of the first layer.

Back to tab navigation

Article type: Paper
DOI: 10.1039/F19858100847
Citation: J. Chem. Soc., Faraday Trans. 1, 1985,81, 847-855
  •   Request permissions

    Nuclear magnetic resonance and dielectric relaxation investigations of water sorbed by Spherisorb silica

    P. G. Hall, R. T. Williams and R. C. T. Slade, J. Chem. Soc., Faraday Trans. 1, 1985, 81, 847
    DOI: 10.1039/F19858100847

Search articles by author

Spotlight

Advertisements