Issue 4, 2018
From the journal:

Physical Chemistry Chemical Physics

Correction: Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

Dong-Jin Yun,a   Seyun Kim,b   Changhoon Jung,a   Chang-Seok Lee,a   Hiesang Sohn,c   Jung Yeon Won,a   Yong Su Kim,a   JaeGwan Chung,a   Sung Heo,a   Seong Heon Kim,a   Minsu Seol*d  and  Weon Ho Shin*e  

* Corresponding authors

a Analytical Science Laboratory, Samsung Advanced Institute of Technology, 130 Samsung-ro, Yeongtong-gu, Suwon, Gyeonggi-do 16678, Republic of Korea

b Materials Research Center Samsung Advanced Institute of Technology, 130 Samsung-ro, Yeongtong-gu, Suwon, Gyeonggi-do 16678, Republic of Korea

c Department of Chemical Engineering, Kwangwoon University, 20 Kwangwoon-Ro, Nowon-Gu, Seoul 01897, Republic of Korea

d Graphene Center Samsung Advanced Institute of Technology, 130 Samsung-ro, Yeongtong-gu, Suwon, Gyeonggi-do 16678, Republic of Korea
E-mail: Minsu.seol@samsung.com

e Energy Materials Center, Energy & Environment Division, Korea Institute of Ceramic Engineering & Technology, 101 Soho-ro, Jinju-si, Gyeongsangnam-do 52851, Republic of Korea
E-mail: whshin@kicet.re.kr

Abstract

Correction for ‘Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering’ by Dong-Jin Yun et al., Phys. Chem. Chem. Phys., 2018, 20, 615–622.

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Article information

DOI
https://doi.org/10.1039/C7CP90282D
Article type
Correction
Submitted
20 Dec 2017
Accepted
20 Dec 2017
First published
05 Jan 2018
This article is Open Access
Creative Commons BY license

Phys. Chem. Chem. Phys., 2018,20, 2914-2914

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Correction: Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

D. Yun, S. Kim, C. Jung, C. Lee, H. Sohn, J. Y. Won, Y. S. Kim, J. Chung, S. Heo, S. H. Kim, M. Seol and W. H. Shin, Phys. Chem. Chem. Phys., 2018, 20, 2914 DOI: 10.1039/C7CP90282D

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