Issue 26, 2013

The link between mechanisms of deposition and the physico-chemical properties of plasma polymer films

Abstract

Film thickness and functional group retention are routinely measured parameters for plasma polymers. It is known that other parameters such as density, solubility and mechanical properties can affect the performance of the plasma polymer film, however such parameters are not often measured; nor is there any understanding of the link between the mechanisms of film growth and these properties. In this investigation we produced thin films from three classes of commonly used plasma polymers (hydrocarbons, glymes and carboxylic acids). By choosing the monomer structure and applied RF power, the dominant mechanism of film growth was varied between ionic deposition and neutral grafting. The density, solubility and modulus of the resulting films were then measured by atomic force microscopy. Films grown from saturated monomers had higher moduli, were less soluble, and surprisingly had lower density compared to their unsaturated analogues. The results demonstrate that cognizance of the mechanism of film growth allows the physical properties of the film to be tailored for specific applications.

Graphical abstract: The link between mechanisms of deposition and the physico-chemical properties of plasma polymer films

Supplementary files

Article information

Article type
Paper
Submitted
16 Apr 2013
Accepted
23 May 2013
First published
23 May 2013

Soft Matter, 2013,9, 6167-6175

The link between mechanisms of deposition and the physico-chemical properties of plasma polymer films

A. Michelmore, D. A. Steele, D. E. Robinson, J. D. Whittle and R. D. Short, Soft Matter, 2013, 9, 6167 DOI: 10.1039/C3SM51039E

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