Developing Polymer Materials (MC9)

Conveners: 

Chris Ober, Cornell University, USA 

Wilhelm Huck, University of Cambridge, UK

Programme:

Wednesday 5 August (morning)

Keynote Speaker

Speakers

Electronically active block copolymers 
Henri Cramail, Université de Bordeaux, France

Directed assembly of block copolymer materials
Padma Gopalan, University of Wisconsin-Madison, USA

Direct patterning templates by POSS containing block copolymers
Teruaki Hayakawa, Tokyo Institute of Technology, Japan

Synthesis and characterization of novel block copolymers by controlled radical polymerizations
Dhamodharan Raghavachari Iyengar, Indian Institute of Technology Chennai, India

Symposium Information

The IUPAC Polymer Division is supporting this exciting symposium, which focuses on "nanopatterning and self-assembling materials" (NSAM), in particular the synthetic, physical and materials chemistry of self-organizing polymers such as liquid crystals, block copolymers and related biopolymers, with an interest in the use of these materials to enable nanopatterning at length scales smaller than conventional high-resolution lithography.  

This symposium is extremely timely in terms of scientific and technological impact, with the microelectronics and information storage industries making regular advances in this area.